| Title |
Thermal oxidation in LOCOS, PBL and SWAMI micro and nano structures / |
| Another Title |
Terminė oksidacija LOCOS, PBL ir SWAMI mikro ir nano matmenų technologijose. |
| Another Title |
Термическое окисление в LOCOS, PBL и SWAMI структурах при микро- и наноуровнях. |
| Authors |
Andriukaitis, D ; Anilionis, R |
| Full Text |
|
| Is Part of |
Elektronika ir elektrotechnika.. Kaunas : Technologija. 2007, Nr. 3, p. 23-26.. ISSN 1392-1215. eISSN 2029-5731 |
| Keywords [eng] |
microelectronics ; electrolytic oxidation ; strains and stresses |
| Abstract [eng] |
Problems of thermal oxidation, related with LOCOS, PBL and SWAMI technologies wуку researched. The stresses, which appear during thermal oxidation are analysed in micro and nano scales levels in mentioned technologies. Thermal oxidation process is simulated with ATHENA. The Deal-Grove model is used for the oxide growth kinetics. Both in micro and nano scale structures stress created in SWAMI is less than in PBL and LOCOS. Maximum stress created in LOCOS is greater than in SWAMI, but less than PBL. Using thermal oxidation in nano scale created stresses are greater than in micro scale structures. |
| Published |
Kaunas : Technologija |
| Type |
Journal article |
| Language |
English |
| Publication date |
2007 |
| CC license |
|
