Title Selection of photopolymer for microrelief formation by two-stage cold stamping method
Another Title Fotopolimero tipo įtakos dviem UV spinduliuotės etapais formuojant plonų polimerų dangų mikroreljefą tyrimas.
Authors Milinavičiūtė, Asta ; Jankauskaitė, Virginija ; Fataraitė, Eglė ; Narmontas, Pranas
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Is Part of Materials science = Medžiagotyra.. Kaunas : Technologija. 2010, vol. 16, no. 3, p. 210-216.. ISSN 1392-1320. eISSN 2029-7289
Keywords [eng] Cold stamping ; Photopolymer ; UV curing ; Periodical structure ; Mechanical properties ; Optical properties
Abstract [eng] Microrelief formation by embossing the master matrix (with the period of 3.5 μm and depth of 1 μm) on photopolymer coatings and its application for large areas embossing technology has been investigated. The method embodies the direct contact microrelief cold stamping and two stages of UV curing processes. The purpose of the initial (stage I) UV curing is to obtain the coating of such hardness that periodical structure with the precise geometry could be embossed. The aim of the final (stage II) UV curing is to stabilize the mechanical properties of photopolymer coating and to fix the geometry of embossed microrelief. The investigations were performed using three types of acrylate based commercial photopolymers. The wetting and mechanical properties, surface topography of photopolymer coatings, diffraction efficiency and geometry of embossed periodical structures have been investigated in order to find the effective durations for both UV curing stages and define parameters of replication process. The quality of replicated microrelief was found to be in great dependence on the photopolymer type, its wetting properties, hardness and surface structure of the coatings and parameters of replication process.
Published Kaunas : Technologija
Type Journal article
Language English
Publication date 2010
CC license CC license description