| Title |
Tailoring mesoporous silicon surface to form a versatile template for nanoparticle deposition / |
| Authors |
Khinevich, Nadzeya ; Juodėnas, Mindaugas ; Tamulevičienė, Asta ; Bandarenka, Hanna ; Tamulevičius, Sigitas |
| DOI |
10.3390/coatings11060699 |
| Full Text |
|
| Is Part of |
Coatings.. Basel : MDPI. 2021, vol. 11, iss. 6, art. no. 699, p. 1-10.. ISSN 2079-6412 |
| Keywords [eng] |
porous silicon ; electrochemical etching ; parasitic layer ; reactive ion etching ; nanoparticle array |
| Abstract [eng] |
Porous silicon (PS) can be used as a loading template in sensing or as a matrix to develop nanoparticle arrays. We present a comprehensive study of PS morphology and optical properties before and after the pore opening process, including the determination of thickness, pore size, and pore density of PS layers, its surface wettability, and reflectivity. The PS samples were fabricated by electrochemical anodization of monocrystalline silicon wafer in 5–20 wt.% hydrofluoric acid (HF) solution at a current density in the range of 20–200 mA/cm2. Anodization was followed by the pore opening process, i.e., the removal of a parasitic superficial layer with a “bottleneck” structure by reactive ion etching (RIE). The results illustrate that “bottleneck”-free PS allows to achieve a high pore density using a low HF concentration and a reduced current density. We established that this structure demonstrates higher hydrophobicity in comparison to the samples before RIE. The applicability of the developed “bottleneck”-free PS was tested via filling the pores with silver nanoparticles, indicating its potential use as a template for the fabrication of nanoparticle arrays. |
| Published |
Basel : MDPI |
| Type |
Journal article |
| Language |
English |
| Publication date |
2021 |
| CC license |
|
