| Abstract [eng] |
Interest in sp2-type carbon coatings and carbon nanostructures has grown with the observation that these can improve substrate properties and improve applicability in a variety of fields: the electronics industry, solar cell manufacturing, battery manufacturing, and more. Titanium dioxide and graphite-type carbon coatings are used in the production of solar cells, as the formed composite has a wider light spectrum range due to the electronically conductive graphite-type carbon coating and titanium dioxide permeability band, showing a much more stable structure resistant to mechanical damage (delamination, peeling). Plasma-activated chemical vapor deposition is a popular method for forming carbon coatings, the coating formation rate is high, uniform coatings are obtained, and the sp2/sp3 ratio is controlled by easily changing the formation conditions (gas type, gas flow rate, substrate, power, deposition time, and other conditions). When it was noticed that metallic impurities change the properties of the abrasive coating, the latter were introduced into the substrate and act as catalytic centers. In this work, carbon coatings were formed by plasma-activated chemical vapor deposition by varying generator power and gas flow in a vacuum system. Coatings are formed on different substrates: silicon, glass and titanium dioxide with gold particles. The formation of carbon coatings was studied using ellipsometry, Raman spectroscopy, and ultraviolet-visible light spectroscopy. The study showed that typical amorphous carbon coatings are formed on surfaces. The gold particles caused an increase in the amount of sp2 in the coating. |
