Title Formation of OVD using laser interference lithography /
Another Title Optiškai kintančių ženklų formavimas interferencine lazerine litografija.
Authors Tamulevičius, Tomas ; Tamulevičius, Sigitas ; Andrulevičius, Mindaugas ; Guobienė, Asta ; Puodžiukynas, Linas ; Janušas, Giedrius ; Griškonis, Egidijus
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Is Part of Materials science = Medžiagotyra.. Kaunas : Technologija. 2007, vol. 13, no. 3, p. 183-187.. ISSN 1392-1320. eISSN 2029-7289
Keywords [eng] optically variable devices (OVDs) ; laser interference lithography (LIL) ; submicron period diffraction gratings ; diffraction efficiency
Abstract [eng] In the present research we have fabricated and investigated optically variable devices (OVDs) (a system of submicron period surface relief diffraction gratings). For this purpose we have recorded interference pattern of two HeCd laser beams through a set of masks, forming contours of the image, in the photoresist (holographic technique). Changing the angles between the interfering beams we have achieved 0.7, 0.8, 0.9 and 1.2 μm period diffraction gratings. The microrelief of diffraction gratings from the resist was transferred to the metallic stamp using vacuum deposition (of Ag, Ni, Cu) and electrochemical nickel deposition. Diffraction efficiency of the diffraction gratings was measured experimentally and linear dimensions of diffraction gratings were defined by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The main experimental results were compared with the computer simulations where the standard software (“PCGrate”) was employed to calculate diffraction efficiency of the different depth of diffraction gratings for two wavelengths of the visible light. Influence of different sublayers used during the electrochemical deposition on the parameters (period, depth and shape) of the submicron structures was defined.
Published Kaunas : Technologija
Type Journal article
Language English
Publication date 2007
CC license CC license description