Title Rational parameters selection influence to the adequate selection algorithm by estimating local oxide influence /
Another Title Racionalių parametrų įtaka atitikties algoritmui įvertinant terminio lokaliojo oksido poveikį.
Authors Andriukaitis, D
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Is Part of Elektronika ir elektrotechnika.. Kaunas : Technologija. 2010, Nr. 3, p. 27-30.. ISSN 1392-1215. eISSN 2029-5731
Abstract [eng] The production process is a sequence of operations in order to obtain the implementation of the elements or integrated structures with the necessary performance characteristics of the very large scale integration. In this case the manufacture of integrated circuits focuses on the area where the integrated element is being formed. It is essential that the area dimensions at the beginning of the technological processes must be kept the same during the whole technological process. Rational parameters are defined of the thermal process simulation, creating the LOCOS, where the t=90 min, T=1100 ºC, SiO2=0,02 μm, Si3N4=0,1 μm (PO2=1 atm) in the three-dimensional integrated structures.
Published Kaunas : Technologija
Type Journal article
Language English
Publication date 2010
CC license CC license description