| Title |
Formation and analysis of dot-matrix holograms / |
| Another Title |
Mikrodifrakcinių elementų hologramų formavimas ir tyrimas. |
| Authors |
Andrulevičius, Mindaugas ; Tamulevičius, Tomas ; Tamulevičius, Sigitas |
| Full Text |
|
| Is Part of |
Materials science = Medžiagotyra.. Kaunas : Technologija. 2007, vol. 13, no. 4, p. 278-281.. ISSN 1392-1320. eISSN 2029-7289 |
| Keywords [eng] |
dot-matrix hologram ; laser beam interference lithography ; dot matrix origination ; diffraction efficiency |
| Abstract [eng] |
In the present research we have fabricated and investigated dot-matrix hologram in the photoresist. Using X-Y motorized translation stage we have covered the substrate with diffractive pixels. Dot-matrix pixels in the photoresist where formed by laser beam interference lithopgraphy (LIL) employing He-Cd (441.6 nm) laser. A simplified Diffractive Optically Variable Imaging Device (DOVID) allowing quantative image analysis was formed from the array of two different orientation difractive pixels. The orientation of the diffraction grating in the single pixel was changed using rotational motorized stage. The sample was analysed opticaly demonstrating its capabilities of suppression and addition of the “LT” image and the baground. Diffraction efficiency of single pixels estimated using diffraction stand and employing three different lasers: He-Ne 632.8 nm, DPSS 532 nm and He-Cd 441.6 nm was performed to demonstrate efficiency of the simplified dot matrix hologram. The original microrelief of the DOVID formed in the photoresist could be transferred to the shim for the mass production by thermoembosing or UV imprinting. |
| Published |
Kaunas : Technologija |
| Type |
Journal article |
| Language |
English |
| Publication date |
2007 |
| CC license |
|
