Title |
Scratching the polymethyl methacrylate and photo resist samples using atomic force microscopy / |
Another Title |
Polimetilmetakrilato ir šviesai atsparių bandinių braižymas panaudojant atominės jėgos mikroskopiją. |
Authors |
Nemciauskas, K ; Seniūnas, G ; Snitka, V |
Full Text |
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Is Part of |
Mechanika.. Kaunas : Technologija. 2006, Nr. 1, p. 61-65.. ISSN 1392-1207. eISSN 2029-6983 |
Abstract [eng] |
This paper analyses the Atomic Force Microscope (AFM) probe as a well established tool for the characterization of the topography, friction, adhesion forces and surface as the modification tool from a micrometer level down to a sub-nanometre level. Micro scale scratches and wear resistance tests using an atomic force microscope have been conducted on polymethyl methacrylate (PMMA) and photo resist coatings. AFM lithography results in the formation of extremely small features. The areas, mechanically-scratched using AFM cantilever, are better susceptible to modification than the same but unscratched surfaces going to be practice to nano electronic and biological structures. |
Published |
Kaunas : Technologija |
Type |
Journal article |
Language |
English |
Publication date |
2006 |
CC license |
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