| Abstract [eng] |
Carbon films have a wide range of applications because of their exceptional features. It is possible to modify the properties of carbon films in wide range by changing the deposition parameters. One of the key parameters is temperature. Temperature affects the structure of the films and also their characteristics. In this work, carbon films were deposited at different temperatures in atmospheric pressure and in vacuum by using plasma jet and inductively coupled plasma techniques. Temperature’s influence on coating surface morphology was investigated by scanning electron microscope and atomic force microscope. The results of microscopy analysis revealed that increase in temperature resulted in more porous surface of carbon films deposited by plasma jet technique. Surface roughness of coating deposited in vacuum also increased when temperature increased. X–ray energy dispersive spectroscopy showed that raise in temperature caused the decrease of oxygen concentration in carbon films. Carbon to oxygen ratio in plasma sprayed coatings increased from 3,1 to 7,3 when temperature increased from ~1000 oC to ~1150 oC. The raise in temperature from 300 oC to 550 oC was followed by increase of the carbon to oxygen ratio (from 3,8 to 36,6) in coatings deposited in vacuum. According to the results of Raman spectroscopy, films deposited by using both techniques exhibits less disordered graphitic structure when the temperature is raised. The G peak became narrower and the ratio of D and G peak intensity decreased which insists that concentration of sp2 C=C sites increased and concentration of defects decreased. |
