| Abstract [eng] |
Zinc oxide is semiconductor material suitable for UV light-emitting diodes, lasers, and detectors, transparent electrodes for solar cells, and hetero-substrates for GaN. Film formation techniques comprised growth methods such as closed space vapor transport (CSVT), metal-organic chemical vapor deposition, reactive ion sputtering, and pulsed laser deposition. From the analysis of publications it can be done conclusion that the reactive magnetron sputtering is most attractive method. On experimental section zinc oxide films were deposited and influence of deposition and annealing parameters on thin film optical and electrical properties was investigated. |
