| Abstract [eng] |
Deposition of the thin film coatings is a process that is being intensively developed and realised by means of various methods. In order to form high quality structures, the control of specific parameters is a must. Such parameters include: pressure and temperature of the vacuum system, particle flux density, the angle at which the substrate is rotated etc. A completely new, Monte-Carlo based, algorithm simulating the coating growth on a rigid surface, was described in this thesis. The main parameters of this model were described as well as literature analysis was performed, where the works of other authors, as well as theoretical information, regarding this topic, were discussed. Examples of simulated structures were provided. The working principles of this model were discussed in detail. According to the results, the processes that are present during the growth of real thin films, were analysed. It was noticed, that the results obtained with this model, reflect the works of other authors, and the structures of some real coatings as well. It is planned to change the program code so that the deposition would happen in a hexagonal, instead of orthogonal lattice. In the near future, the following processes and additions are also planned to be implemented: particle sputtering, ray tracing algorithm for more accurate description of various trajectories, thermal conductivity, melting etc., thus bringing one step closer to the goal of evaluating what the coating will be like before the real deposition begins. |
