| Title |
Investigating graphene growth by plasma-enhanced CVD using various catalyst thicknesses / |
| Authors |
Monshi, Marjan |
| Full Text |
|
| Is Part of |
Graphene 2021: Graphene and 2DM international conference, November 2-5, 2021, virtual.. [S.l.] : [s.n]. 2021, ePoster 67, p. 67-69 |
| Keywords [eng] |
nickel film ; graphene grow ; PECVD technique |
| Abstract [eng] |
Graphene as 2D material with extraordinary properties has attracted the interest of research communities to master the synthesis at a large scale without sacrificing the quality. Plasma-enhanced chemical vapor deposition (PECVD) has attracted more and more attention as a promising method for controllable graphene synthesis. In this research, we report the correlation between the thickness variations of the Nickel as catalyst film and the quality of deposited Graphene using Quartz as substrate. Surface morphology was studied by atomic force microscopy (AFM). Raman spectroscopy was used to investigate the quality of graphene. The results showed that graphene samples deposited on nickel films of 40 and 70 nm thickness possess best quality. |
| Published |
[S.l.] : [s.n] |
| Type |
Conference paper |
| Language |
Lithuanian |
| Publication date |
2021 |
