| Title |
Michaelis–Menten kinetics during chemical etching of germanium / |
| Authors |
Knizikevičius, Rimantas |
| DOI |
10.1016/j.sctalk.2022.100079 |
| Full Text |
|
| Is Part of |
Science talks.. London : Elsevier. 2022, vol. 4, art. no. 100079, p. 1-4.. ISSN 2772-5693 |
| Keywords [eng] |
germanium ; Br2 gas ; chemical etching ; Michaelis-Menten kinetics |
| Abstract [eng] |
The chemical etching of germanium in Br2 environment is investigated theoretically. The steady-state etching rate is described by the Michaelis-Menten equation. It shown that Michaelis constant is the ratio of desorption rate constant to reaction rate constant. The activation energies of elementary processes are evaluated using the transition state theory. It is found that the activation energy of Ge(s) + Br2(g) → GeBr2(a) reaction is equal to (1.168±0.173) eV, and the desorption activation energy of GeBr2 molecules is equal to (1.404±0.077) eV. The Michaelis constant depends on temperature because the reaction activation energy differs from the desorption activation energy. Surface passivation by GeBr radicals is not observed under the investigated experimental conditions. |
| Published |
London : Elsevier |
| Type |
Journal article |
| Language |
English |
| Publication date |
2022 |
| CC license |
|
